For sensors made with Cambrios' MOS film, the dimensions of the conductive lines and spaces in the bezel area can be dramatically reduced in size by 3-fold relative to traditional sensors. This feature enables an extremely narrow border.
Cambrios developed the etchant with high selectivity for double patterning process to effectively avoid mutual interference and damage of the cooper and silver during the etching process (Cu ΔRs<10%; SNW ΔRs<10%) and to control the deviation of the line width within 5%.
|Transparent conductive material||ITO||SNW|
|Etchant||General etchant||High sensitivity etchant|
|Application||General touch panel||General/ flexible touch panel|
Compatible with the silver nanowire
Promotion of the optical property
Modification of the surface energy
Quality bending strength