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Conductive Film Lithography
Best Solution for Flexible Touch with Narrow Border

For sensors made with Cambrios' MOS film, the dimensions of the conductive lines and spaces in the bezel area can be dramatically reduced in size by 3-fold relative to traditional sensors. This feature enables an extremely narrow border.

Narrow Border Comparison
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Precise Etching for Loss Minimization

Cambrios developed the etchant with high selectivity for double patterning process to effectively avoid mutual interference and damage of the cooper and silver during the etching process (Cu ΔRs<10%; SNW ΔRs<10%) and to control the deviation of the line width within 5%.

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High Process Compatibility for Cost Reduction
By changing the said high selectivity etchant with corresponding process technology, the compatible MOI (Metal on ITO) production equipment is able to produce MOS after the double patterning without any additional overcoat.
 
  MOI MOS
Transparent conductive material ITO SNW
Etchant General etchant High sensitivity etchant
Equipment Compatible Compatible
Application General touch panel General/ flexible touch panel
Self-developed Flexible Hard Coat
  • Compatible with the silver nanowire

  • Promotion of the optical property

  • Modification of the surface energy

  • Quality bending strength

Stack Structure
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